One of our customers is in the business of scanning a large number of images and archiving the data onto silicon wafers using semiconductor lithography.

After examining the scans we determined that converting directly to MEBES generates the most reasonable amount of data and avoids the additional step and associated costs of fracturing GDSII to MEBES when using Ebeam or Laserwriters that support MEBES.

There are two distinct steps in producing the final mask

1) converting the scans from a bitmap format such as TIFF into MEBES data

2) arraying the hundreds (or thousands) of scans onto the mask
Batch Conversion of TIFF to MEBES
To convert a large number of TIFF images into MEBES we will be using the TIF2MEBES program in “batch” mode.

Place all of the .tif files in a single directory. These files are all monochrome tiff and are each about 1 MB in size. In that same directory create a simple batch file called run.bat. It will contain one line:
for %%f in (*.tif) do c:\wcad\tiff2mebes\tiff2mebes.exe -mebes:3 -pixel:2  %%f
for %%f in (*.tif) do
this loops through all of the files that end in *.tif and executes whatever is behind the do. %%file is a variable for the file name.
the full path to the tiff2mebes executable.
tells tiff2mebes to produce MEBES III output
1 pixel = 2 um
the file to process. By default the output file will use the input file name with suffix .mbs
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